Nitrogen Trifluoride (NF3)


CAS nr.



Measuring ranges

Standard range: 0 - 30 ppm


TLV level (TLV-TWA)

10 ppm


Relative density (compared to air):




  • Nitrogen trifluoride is used in the plasma etching of silicon wafers
  • Cleaning of the PECVD chambers in the production of LCD's (liquid-crystal displays) and silicon-based thin-film solar cells


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